Field effect transistor

ABSTRACT

Disclosed is an HJFET  110  which comprises: a channel layer  12  composed of In y Ga 1-y N (0≦y≦1); a carrier supply layer  13  composed of Al x Ga 1-x N (0≦x≦1), the carrier supply layer  13  being provided over the channel layer  12  and including at least one p-type layer; and a source electrode  15 S, a drain electrode  15 D and a gate electrode  17  which are disposed facing the channel layer  12  through the p-type layer, and provided over the carrier supply layer  13.  The following relational expression is satisfied: 5.6×10 11 x&lt;N A ×η×t [cm −2 ]&lt;5.6×10 13 x, where x denotes an Al compositional ratio of the carrier supply layer, t denotes a thickness of the p-type layer, N A  denotes an impurity concentration, and η denotes an activation ratio.

TECHNICAL FIELD

The present invention relates to a field effect transistor, and inparticular to a hetero junction field effect transistor (HJFET)containing a Group III nitride semiconductor as a material.

BACKGROUND ART

There are known conventional hetero junction field effect transistors(HJFETs) found in Non-Patent Document 1 and Patent Document 1.

FIG. 15 is a sectional view showing a configuration of an HJFETdescribed in Non-Patent Document 1.

The HJFET shown in FIG. 15 has a buffer layer 201, a channel layer 202composed of gallium nitride (GaN), and a carrier supply layer 203composed of aluminum gallium nitride (AlGaN) stacked in this order on asapphire substrate 200.

In the HJFET, a two-dimensional electron gas 204 is formed in thechannel layer 202 in the vicinity of the interface with the carriersupply layer 203, based on piezoelectric polarization effect ascribableto difference in the lattice constants between GaN and AlGaN, and basedon an effect of spontaneous polarization.

On the carrier supply layer 203, there are formed a source electrode205S and a drain electrode 205D while establishing ohmic contacttherewith. A gate electrode 207 is formed on the AlGaN carrier supplylayer 203 in a region fallen between the source electrode 205S and thedrain electrode 205D, while establishing Schottky contact at theinterface 203A with the carrier supply layer 203.

On the carrier supply layer 203 and the gate electrode 207, there isprovided also a surface passivation film 208 composed of silicon nitride(SiN).

Alternatively, Patent Document 1 describes a normally-off HJFET having achannel layer composed of a non-doped GaN layer, and a barrier layercomposed of AlGaN formed on, and brought into contact with, the channellayer. In order to realize the normally-off configuration of HJFET,which is intrinsically configured as normally-on, there is alsodescribed that a p-type semiconductor layer containing a p-type impurityis provided in the barrier layer under the gate electrode.

[Non-Patent Document 1] Y. Ando et al., Technical Digest ofInternational Electron Device Meeting, p. 381, 2001

[Patent Document 1] Japanese Patent Application Publication No.2004-273486

DISCLOSURE OF THE INVENTION Problem to be Solved by the Invention

By the way, it has been known that the barrier height at the Schottkyinterface with a Group III nitride semiconductor such as GaN, AlGaN orthe like is determined by difference between work function of a metaland electron affinity of the semiconductor, because pinning of the Fermilevel exerts only a small influence. For this reason, the Schottkybarrier height of AlGaN having an Al compositional ratio of 0.2, forexample, will be relatively as low as 0.8 to 1.0 eV or around, althoughslightly depending on the electrode metal. Accordingly, as has beendescribed with respect to the HJFET referring to FIG. 15, the Group IIInitride HJFET using AlGaN as the carrier supply layer has been sufferingfrom a problem of large density of gate leakage current, which limitsthe operation drain voltage.

In addition, the configuration of Patent Document 1 described above inthe BACKGROUND ART has been suffering from that, because of itsnormally-off configuration, or because of having a positive thresholdvoltage, formation of a p-type semiconductor layer in the region otherthan the region right under the gate electrode may lower the channelconcentration in that region, making current difficult to flowtherethrough.

The configuration has been suffering from also that the process ofmanufacturing are complicated, because the p-type impurity should beintroduced only in the vicinity of the region right under the gateelectrode.

Means for Solving the Subjects

According to the present invention, there is provided a field effecttransistor which comprises:

-   a channel layer composed of In_(y)Ga_(1-y)N (0≦y≦1);-   a carrier supply layer composed of Al_(x)Ga_(1-x)N (0≦x≦1), the    carrier supply layer being provided over the channel layer and    including at least one p-type layer; and-   a source electrode, a drain electrode and a gate electrode which are    disposed facing the channel layer through the p-type layer, and    provided over the carrier supply layer,-   wherein the following relational expression is satisfied:

5.6×10¹¹ x<N _(A) ×η×t[cm⁻²]<5.6×10¹³ x,  [Mathematical Formula 1]

where x denotes an Al compositional ratio of the carrier supply layer, tdenotes a thickness of the p-type layer, N_(A) denotes an impurityconcentration, and η denotes an activation ratio.

According to the present invention, there is provided also a fieldeffect transistor which comprises:

-   a channel layer composed of In_(y)Ga_(1-y)N (0≦y≦1) in which    two-dimensional electron gas is to be formed;-   a carrier supply layer composed of Al_(x)Ga_(1-x)N (0≦x≦1), the    carrier supply layer being provided over the channel layer and    including at least one p-type layer; and-   a source electrode, a drain electrode and a gate electrode which are    disposed facing the channel layer through the p-type layer, and    provided over the carrier supply layer, wherein:-   the following expression is satisfied:

x_(a<x) ₁,

where x_(a) denotes an Al compositional ratio of the carrier supplylayer at an interface with the gate electrode, and x₁ denotes an Alcompositional ratio at an interface with the channel layer; and

-   the following expression is satisfied:

5.6×10¹¹ x ₁ <N _(A) ×η×t[cm⁻²]+5.6×10¹³(x ₁ −x _(a))<5.6×10¹³ x₁,  [Mathematical Formula 3]

where x_(a) denotes the Al compositional ratio, t denotes a thickness ofthe p-type layer, N_(A) denotes an impurity concentration, and η denotesan activation ratio.

In the present invention, the potential barrier against electrons underthe gate electrode may be thickened, and thereby the gate leakagecurrent may be reduced. In addition, lowering in the maximum draincurrent, as compared with the case without doping a p-type impurity, maybe suppressed within a specified range.

In the present invention, the threshold voltage of the field effecttransistor has a negative value. Unlike the HJFET described in PatentDocument 1 explained above in BACKGROUND ART, having a positivethreshold voltage, the present invention may efficiently producetwo-dimensional electron gas over the entire range of the carrier supplylayer, even if the source electrode and the drain electrode are providedon the p-type layer, and thereby current may stably be supplied.

Moreover, in the present invention, the p-type layer resides also in theregions between the source and the gate, and between the gate and thedrain, which are susceptible to surface electric charge. As aconsequence, influence of the surface electric charge may partially beshielded by the p-type layer, making the current-voltage characteristicsmore stable against surface conditions. For example, so-called currentcollapse, which is a phenomenon characterized by lowering in amplitudeof drain current under input of large-amplitude voltage to the gateelectrode, may be suppressed.

In the present invention, a part of the gate electrode may be buried inthe carrier supply layer. Alternatively, in the present invention, apart of the p-type layer may be etched off to give a buried gateelectrode structure. Also in this case, similar effects may be obtained,if the sheet impurity concentration of the p-type layer, which residebetween the recessed portion with which the gate electrode is broughtinto contact and the channel layer, satisfies the relational expressiondescribed above.

According to the present invention, there is provided still also a fieldeffect transistor which comprises:

-   a channel layer composed of In_(y)Ga_(1-y)N (0≦y≦1);-   a carrier supply layer composed of Al_(x)Ga_(1-x)N (0≦x≦1), the    carrier supply layer being provided over the channel layer and    including at least one p-type layer; and-   a source electrode, a drain electrode and a gate electrode which are    disposed facing the channel layer through the p-type layer, and    provided over the carrier supply layer, the gate electrode being    formed to be in contact with a recess portion formed by removing a    part of the carrier supply layer,-   wherein the following relational expression is satisfied:

5.6×10¹¹ x<N _(A) ×η×t[cm⁻²]<5.6×10¹³ x,

where t denotes a thickness of the p-type layer between the recessedportion and the channel layer, N_(A) denotes an impurity concentration,and η denotes an activation ratio.

According to the present invention, there is provided still also a fieldeffect transistor which comprises:

-   a channel layer composed of In_(y)Ga_(1-y)N (0≦y≦1);-   a carrier supply layer composed of Al_(x)Ga_(1-x)N (0≦x≦1), the    carrier supply layer being provided over the channel layer and    including at least one p-type layer; and-   a source electrode, a drain electrode and a gate electrode which are    disposed facing the channel layer through the p-type layer, and    provided over the carrier supply layer, the gate electrode being    formed to be in contact with a recess portion formed by removing a    part of the carrier supply layer,-   wherein the following relational expression is satisfied:

5.6×10¹¹ x ₁ <N _(A) ×η×t[cm⁻²]+5.6×10¹³(x ₁ −x _(a))<5.6×10¹³ x ₁,

where x_(a) denotes an Al compositional ratio of the carrier supplylayer at an interface with the gate electrode and is smaller than x₁, x₁denotes an Al compositional ratio at an interface with the channellayer, t denotes a thickness of the p-type layer between the recessedportion and the channel layer, N_(A) denotes an impurity concentration,and η denotes an activation ratio.

It is to be understood that any arbitrary combinations of the individualconfigurations, any exchanges of expression in the present inventionamong method, apparatus and so forth, may be effective as embodiments ofthe present invention.

Effect of the Invention

As described above, the present invention successfully reduces the gateleakage current of the Group-III nitride HJFET.

BRIEF DESCRIPTION OF THE DRAWINGS

The above and other objects, advantages and features of the presentinvention will be more apparent from the following description ofcertain preferred embodiments taken in conjunction with the accompanyingdrawings.

[FIG. 1] is a sectional view showing a sectional structure of an HJFETin an embodiment.

[FIG. 2] shows potential distributions of the HJFET in the embodiment.

[FIG. 3] shows dependence of gate current of the HJFET in the embodimenton p-type impurity concentration.

[FIG. 4] shows dependence of maximum drain current of the HJFET in theembodiment on p-type impurity concentration.

[FIG. 5] shows dependence of threshold voltage of the HJFET in theembodiment on p-type impurity concentration.

[FIG. 6] is a sectional view showing a sectional structure of the HJFETin an embodiment.

[FIG. 7] is a sectional view showing a sectional structure of the HJFETin an embodiment.

[FIG. 8] is a sectional view showing a sectional structure of the HJFETin an embodiment.

[FIG. 9] is a sectional view showing a sectional structure of the HJFETin an embodiment.

[FIG. 10] is a sectional view showing a sectional structure of the HJFETin an embodiment.

[FIG. 11] is a sectional view showing a sectional structure of the HJFETin an embodiment.

[FIG. 12] is a sectional view showing a sectional structure of the HJFETin an embodiment.

[FIG. 13] is a sectional view showing a sectional structure of the HJFETin an embodiment.

[FIG. 14] is a sectional view showing a sectional structure of the HJFETin an embodiment.

[FIG. 15] is a sectional view showing a sectional structure of aconventional HJFET.

BEST MODES FOR CARRYING OUT THE INVENTION

Embodiments according to the present invention will now be explained,referring to the attached drawings. In all drawings, any constituentscommonly appear will be given with the same reference numerals, andexplanation therefor will not be repeated.

First, an outline of the present invention will be explained, for thepurpose of helping the understanding.

FIG. 1 is a sectional view showing a configuration of an HJFET of thepresent embodiment. An HJFET 110 shown in FIG. 1 has a buffer layer 11composed of an aluminum nitride (AlN) layer, a channel layer 12 composedof In_(y)Ga_(1-y)N (0≦y≦1) and a carrier supply layer 13 composed ofAl_(x)Ga_(1-x)N (0≦x≦1) while being brought into contact in this orderon a substrate 10 composed of silicon carbide (SiC).

In this embodiment, the channel layer 12 is composed of an undoped GaNlayer.

The carrier supply layer 13 is provided on the channel layer 12, andincludes at least one p-type layer. In this embodiment, the carriersupply layer 13 is composed of p-type Al_(x)Ga_(1-x)N. The p-typeAl_(x)Ga_(1-x)N layer is provided as being brought into contact with thechannel layer 12, and over the entire region between the source and thedrain.

In the HJFET 110, a two-dimensional electron gas 14 is formed in thechannel layer 12 in the vicinity of the interface thereof with thecarrier supply layer 13, based on piezoelectric polarization effectascribable to difference in the lattice constants between GaN and AlGaN,and based on spontaneous polarization effect. The HJFET 110 isconfigured as generating the two-dimensional electron gas in the channellayer, in the region between the source electrode and the gateelectrode, and in the region between the gate electrode and the drainelectrode, when no voltage is applied to the gate electrode. In otherwords, the HJFET 110 has a negative threshold voltage.

A source electrode 15S, a drain electrode 15D and a gate electrode 17are disposed facing the channel layer 12 through the p-type layer, andprovided over the carrier supply layer 13.

More specifically, over the carrier supply layer 13 composed of p-typeAlGaN, the source electrode 15S and the drain electrode 15D are formed,while individually establishing ohmic contact with the carrier supplylayer 13. The gate electrode 17 is provided in the same plane with thesource electrode 15S and the drain electrode 15D, wherein the bottomsurface of the gate electrode 17 is positioned at the same level withthe bottom surface of the source electrode 15S and the drain electrode15D.

The gate electrode 17 is provided on the carrier supply layer 13 and inthe region fallen between the source electrode 15S and the drainelectrode 15D, while establishing Schottky contact at the interface 13Awith the carrier supply layer 13. Transistor operation is obtained byadjusting potential of the gate electrode 17 to thereby modulateconcentration of the two-dimensional electron gas 14.

In addition, a surface passivation film 18 composed of SiN is providedover the carrier supply layer 13 having the gate electrode 17 formedthereon, as being extended from the top surface of the source electrode15S to the top surface of the drain electrode 15D, so as to cover theregion fallen between the source electrode 15S and the drain electrode15D.

In the HJFET 110, Al compositional ratio x of the carrier supply layer13 composed of p-type AlGaN, thickness t of the carrier supply layer 13composed of p-type AlGaN, impurity concentration N_(A) in p-type AlGaNand activation ratio η satisfy the following relational expression:

5.6×10¹¹ x<N _(A) ×η×t[cm⁻²]<5.6×10¹³ x.  [Mathematical Formula 3]

This will be explained below.

First, fixed charge will generate at the AlGaN/GaN hetero interface,based on spontaneous polarization between Group III atom and N atom, andbased on piezoelectric polarization ascribable to difference in thelattice constant between AlGaN and GaN. Sheet density σ_(P) of thepolarization charge is known to be approximated by the followingequation (1), as a function of Al compositional ratio x of the AlGaNlayer.

[Mathematical Formula 4]

σ_(P) =+qax.  (1)

In the above equation (1), q (=1.6×10⁻¹⁹ C) is elementary charge, and“a” (=5.6×10¹³ cm⁻²) is a proportionality constant. For general growthon Ga face, sign of the polarization charge is given as positive at theAlGaN interface on GaN, and given as negative at the GaN interface onAlGaN. On the other hand, sheet density σ_(A) of ionized impurity chargeis given by the following equation (2), assuming thickness of the p-typeAlGaN layer as t, p-type impurity concentration as N_(A), and activationratio as η:

[Mathematical Formula 5]

σ_(A) =−qN _(A) ηt.  (2)

The thickness t of the p-type AlGaN layer herein means the thickness ofthe carrier supply layer 13 in the region brought into contact with thegate electrode 17. In the HJFET 110 shown in FIG. 1, the gate electrode17 is provided in the same plane with the source electrode 15S and thedrain electrode 15D, and the carrier supply layer 13 having a uniformthickness is provided over the entire region ranging from the sourceelectrode 15S and the drain electrode 15D, including the portion beingin contact with the gate electrode 17. Alternatively, for the case wherethe gate electrode is configured as being formed by removing a part ofthe carrier supply layer, or as having a gate recess structure asdescribed later, the thickness t of the p-type AlGaN layer herein meansthe thickness of the carrier supply layer 13 at the contact surface withthe gate electrode formed as being brought into contact with therecessed portion.

The HJFET 110, characterized by a negative threshold voltage, has thetwo-dimensional electron gas 14 generated in the channel layer in thevicinity of the interface with the carrier supply layer 13, when novoltage is applied to the gate electrode 17.

In this case, the two-dimensional electron gas 14 generates in thechannel layer 12 composed of GaN in the vicinity of the interface withthe carrier supply layer 13 composed of AlGaN, if the absolute value ofionized impurity charge density σ_(A) (minus signed) is smaller than theabsolute value of polarization charge density σ_(P) (positive signed),in other words, if the following relational expression (3) is satisfied.

[Mathematical Formula 6]

|σ_(A)|<|σ_(P)|.  (3)

This condition may be re-written using the above equations (1) and (2),and is given as the following relational expression (3′):

[Mathematical Formula 7]

N _(A) ×η×t[cm⁻²]<5.6×10¹³ x.  (3′)

By doping a p-type impurity into the carrier supply layer 13 composed ofAlGaN, an upwardly convex conduction band profile is obtained. It maytherefore be expected that the energy barrier against electrons may bethickened, and thereby gate tunneling current may be suppressed.However, too low p-type impurity concentration may fail in obtaining aneffect of suppressing the gate leakage current, due to insufficientthickness of the energy barrier. On the other hand, too high p-typeimpurity concentration might fail in forming the two-dimensionalelectron gas 14, but the two-dimensional electron gas may be producibleif the HJFET is configured as satisfying the above relational expression(3) or (3′).

The present inventors then designed conditions of p-type impurityconcentration under which the gate tunneling current can be suppressed,by clarifying relations between parameters relevant to element structureand characteristics of element through numerical calculation.

First, energy distribution of the conduction band was calculated bysolving Poisson's equation. FIG. 2 is a drawing showing an example ofcalculated energy distribution of the conduction band in the directionnormal to the substrate. FIG. 2 shows distance of the carrier supplylayer 13 away from the interface thereof with the gate electrode 17interface (distance=0), wherein longer distance means that the positionis more distant from the gate electrode 17.

FIG. 2 shows the calculated results obtained when effective impurityconcentration in the carrier supply layer 13 composed of AlGaN, that is,a product N_(A)×η of p-type impurity concentration and activation ratio,was varied in three ways such as 0 cm⁻³, 5×10¹⁷ cm⁻³ and 1×10¹⁸ cm⁻³. Alcompositional ratio x of the AlGaN layer herein was assumed as 20%.

In FIG. 2, results obtained N_(A)×η=0 cm⁻³ corresponds to theconventional configuration shown in FIG. 15. As shown in FIG. 2, for thecase of N_(A)×η=0 cm⁻³ a linear energy distribution of the conductionband is obtained in the AlGaN layer. As a consequence, the tunnelbarrier against electrons at the gate interface is thinned, and therebytunneling current increases.

On the other hand, for the case of N_(A)×η=5×10¹⁷ cm⁻³, an upwardlyconvex energy distribution may be obtained, due to negative charge ofionized impurity. As a consequence, the tunnel barrier against electronsat the gate interface may be thickened, and thereby tunneling currentdecreases. For the case of N_(A)×η=1×10¹⁸ cm⁻³, the tunnel barrieragainst electrons at the gate interface may further be thickened, andthereby tunneling current is expected to further be reduced.

Next, the present inventors calculated density of the tunneling currentflowing through the carrier supply layer 13 composed of AlGaN, based onthe results of calculation of energy distribution in the conductionband.

FIG. 3 shows N_(A)×η dependence of gate leakage current estimated fromthe tunneling current density. Three results shown here were obtainedunder Al compositional ratios x of 15%, 20% and 25%. Thickness of thep-type AlGaN layer herein was assumed as t=20 nm.

FIG. 3 shows that the reverse gate leakage current sharply decreased onthe higher concentration side as being bounded by filled dots (•) in thedrawing. Therefore, these dots are now determined as the lower limits ofN_(A)×η. By using the above equations (1) and (2), these points standfor conditions given by:

|σ_(A)|=|σ_(P)|/100.

It is understood that the reverse gate current sharply decreases onhigher concentration side of N_(A)×η. Accordingly, conditions foreffectively reducing the gate leakage current may be given by thefollowing relational expression (4) or (4′). The following relationalexpressions (4) and (4′) may be re-written vice versa using theequations (1) and (2) described above:

[Mathematical Formula 8]

|σ_(A)|>|σ_(P)|/100.  (4)

[Mathematical Formula 9]

N _(A) ηt[cm⁻²]>5.6×10¹¹ x.  (4′)

By combining the above relational expressions (3′) and (4′), thetwo-dimensional electron gas may be formed in the channel, whereinconditions under which an effect of suppressing gate current may beobtained will be given as below:

5.6×10¹¹ x<N _(A) ×η×t[cm⁻²]<5.6×10¹³ x.

In order to further decrease the gate leakage current, it may be goodenough to satisfy the following relational expression (5), where thereverse gate current may be reduced approximately 1/10 times as low asthe undoped case. The following relational expression (5) may bere-written using the above equations (1) and (2), to give the followingrelational expression (5′):

[Mathematical Formula 10]

|σ_(A)|>|σ_(P)|/10.  (5)

[Mathematical Formula 11]

N _(A) ηt[cm⁻²]>5.6×10¹² x.  (5′)

Next, N_(A)×η dependence of the maximum drain current I_(max) wascalculated.

FIG. 4 shows calculated N_(A)×η dependence of I_(max). FIG. 4 showsthree results obtained under Al compositional ratios x of 15%, 20% and25%. Thickness of the p-type AlGaN layer composing the carrier supplylayer 13 was assumed as t=20 nm.

FIG. 4 shows that I_(max) decreased as N_(A)×η increased. However, inFIG. 4, it was shown that ratio of decrease in I_(max) was suppressed toas much as 50% or smaller on the lower concentration side as beingbounded by conditions indicated by open dots (∘), that is, the conditionunder which |σ_(A)|=|σ_(P)|/2 is given. Because the amount of decreasein I_(max) may be suppressed to as much as 50% or smaller if thiscondition is set as the upper limit of N_(A)×η, a distinct decrease incurrent drivability may be suppressed in a more reliable manner. Thiscondition may be given by the following relational expression (6) or(6′). These relational expressions may be re-written vice versa, usingthe above equations (1) and (2).

[Mathematical Formula 12]

|σ_(A)|<|σ_(P)|/2.  (6)

[Mathematical Formula 13]

N _(A) ηt[cm⁻²]<2.8×10¹³ x.  (6′)

In view of further reducing the amount of decrease in I_(max), acondition expressed by the following relational expression (7) or (7′)may be more preferable. In this case, it was shown that the ratio ofdecrease in I_(max) was suppressed to as much as 20% or smaller.

[Mathematical Formula 14]

|σ_(A)|<|σ_(P)|/5.  (7)

[Mathematical Formula 15]

N _(A) ηt[cm⁻²]<1.12×10¹³ x.  (7)

Lastly, the present inventors calculated N_(A)×η dependence of thethreshold voltage V_(th).

FIG. 5 shows calculated N_(A)×η dependence of V_(th). Three resultsshown in FIG. 5 were obtained under Al compositional ratios x of 15%,20% and 25%. Thickness of the p-type AlGaN layer herein was assumed ast=20 nm.

As shown in FIG. 5, V_(th) shifts towards the positive side as N_(A)×ηincreases. The critical points of the relational expression (4), thatis, the points where

|σ_(A)|=|σ_(P)|/100

is satisfied were indicated by filled dots in FIG. 5. On the other hand,the critical points of the relational expression (6), that is, theconditions where

|σ_(A)|=|σ_(P)|/2

is satisfied were indicated by open dots.

From FIG. 5, it is understood that, in the range over which therelational expressions (4) and (6) are satisfied, that is, the rangeover which the following relational expression is satisfied:

|σ_(P)|/100<|σ_(A)|<|σ_(P)|/2,

where V_(th) has a negative value.

Under conditions of making V_(th) negative, the two-dimensional electrongas 14 may be produced even if the gate electrode 17 is not applied withpositive charge, so that the two-dimensional electron gas 14 may beproduced not only under the gate electrode 17, but also in the channellayer between the source electrode 15S and the gate electrode 17.Similarly, the two-dimensional electron gas 14 is produced also in thechannel layer 12 between the gate electrode 17 and the drain electrode15D.

Because the threshold voltage in this embodiment is negative, unlike thecase of Patent Document described above in BACKGROUND ART, transistoroperation may be obtained without doping a p-type impurity onlyselectively under the gate electrode 17, so that the process may besimplified, and thereby cost and yield ratio in manufacturing of theelement may be improved.

Moreover, in this embodiment, the p-type layer is provided also betweenthe source and the gate, and between the gate and the drain, which aresusceptible to surface charge. Accordingly, influences of the surfacecharge may partially be shielded by the p-type layer, and thecurrent-voltage characteristics may be made more stable against thesurface state. For example, current collapse phenomenon may besuppressed.

From the above discussion, it is understood that the gate leakagecurrent may effectively be suppressed by adopting the configurationsatisfying the above relational expression (4) or (4′). In addition,range of N_(A)×η not only for suppressing the gate leakage current, butalso for further suppressing reduction in I_(max) may be given by thefollowing relational expression (8) or (8′):

[Mathematical Formula 16]

|σ_(P)|/100<|σ_(A)|<|σ_(P)|/2.  (8)

[Mathematical Formula 17]

5.6×10¹¹ x<N _(A) ηt[cm⁻²]<2.8×10¹³ x.  (8′)

By adopting the configuration satisfying the above relational expression(8) or (8′), the potential barrier against electrons under the gateelectrode 17 may be thickened, the gate leakage current may be reduced,and thereby a Group III nitride HJFET having predetermined drain currentand threshold voltage may be obtained. Accordingly, high frequencyperformance and power performance of the HJFET may further be improved.As described above referring to FIG, 5, the threshold voltage V_(th) inthe configuration satisfying the following relational expression (8) or(8′) has a negative value.

A more preferable range of N_(A)×η may be expressed by the followingrelational expression (9) or (9′):

[Mathematical Formula 18]

|σ_(P)|/10<|σ_(A)|<|σ_(P)|/5.  (9)

[Mathematical Formula 19]

5.6×10¹² x<N _(A) ηt[cm⁻²]<1.12×10¹³ x.  (9′)

The above description explained the case where the p-type impurityconcentration in the carrier supply layer 13 composed of an AlGaN layeris substantially uniform.

If N_(A) and η in the carrier supply layer composed of AlGaN layer isnot uniform, similar calculation may be proceeded by using moregeneralized relational expressions) (8″) and (9″) obtained by replacingthe portion of N_(A)×η×t in the above-described relational expressions(8′) and (9′) by the following formula:

$\begin{matrix}\lbrack {{Mathematical}\mspace{14mu} {Formula}\mspace{14mu} 20} \rbrack & \; \\{\underset{0}{\int\limits^{t}}{{N_{A}(y)}{\eta (y)}{y}}} & \; \\\lbrack {{Mathematical}\mspace{14mu} {Formula}\mspace{14mu} 21} \rbrack & \; \\{{{5.610^{11}}x} < {\underset{0}{\int\limits^{t}}{{N_{A}(y)}{\eta (y)}{y}}} < {{2.810^{13}}{x.}}} & ( 8^{''} ) \\\lbrack {{Mathematical}\mspace{14mu} {Formula}\mspace{14mu} 22} \rbrack & \; \\{{{5.610^{12}}x} < {\underset{0}{\int\limits^{t}}{{N_{A}(y)}{\eta (y)}{y}}} < {{1.1210^{13}}x}} & ( 9^{''} )\end{matrix}$

N_(A)(y) herein represents distribution of impurity concentration, η(y)represents distribution of activation ratio, wherein integral iscalculated in the direction normal to the substrate. Range ofintegration is determined from the interface of the AlGaN carrier supplylayer 13 with the channel layer 12, to the interface thereof with thegate electrode 17. In the HJFET 110 shown in FIG. 1, N_(A)(y) and η(y)have constant values of N_(A) and η, respectively, so that theintegrated value may be equal to N_(A)×η×t.

FIG. 1 shows a configuration in which the Al compositional ratio in thep-type layer was constant in the direction of stacking. Next, a casewhere the Al compositional ratio in the p-type layer is not uniform willbe explained referring to FIG. 6.

FIG. 6 is a sectional view showing another configuration of the HJFET ofthis embodiment. An HJFET 120 shown in FIG. 6 is obtained by replacingthe carrier supply layer 13 composed of a p-type AlGaN layer in theHJFET 110 shown in FIG. 1, with the carrier supply layer 23 composed ofa p-type composition graded AlGaN layer.

The Al compositional ratio x of the carrier supply layer 23 composed ofan AlGaN layer continuously decreases from the channel interface (x=x₁)towards the surface (x=x₂) (x₁>x₂). It is to be noted that, in FIG. 6and so forth, the Al compositional ratio x of the AlGaN layercontinuously decreasing from the channel interface (x=x₁) to the surface(x=x₂) may be expressed also as “x=x1→x2”.

The HJFET 120 has a planar structure. In other words, the gate electrode17 is provided in the same plane with the source electrode 15S and thedrain electrode 15D, and the bottom surface of the gate electrode 17 ispositioned on the same level with the bottom surface of the sourceelectrode 15S and the drain electrode 15D. Accordingly, the Alcompositional ratio x_(a) of the carrier supply layer 23 composed of anAlGaN layer at the interface 23A thereof with the gate electrode 17 isequal to x₂.

Based on the equation (1), sheet density σ_(P) of polarized chargegenerated at the interface between the carrier supply layer 23 composedof an AlGaN layer and the channel layer 12 composed of a GaN layer isexpressed by the following equation (10):

[Mathematical Formula 23]

σ_(p) =+qax ₁.  (10)

When a GaN layer is stacked on an AlGaN layer, negative polarized chargegenerates at the hetero interface in a discrete manner. Accordingly, ifthe Al compositional ratio is continuously decreased in the carriersupply layer 23 composed of AlGaN, continuous negative polarized chargegenerates in the AlGaN layer. Based on the above equation (1), sheetdensity (σ_(G)) of polarized charge generated in the AlGaN layer underthe gate is expressed by the following equation (11):

[Mathematical Formula 24]

σ_(G) =−qa(x ₁ −x _(a)).  (11)

The polarized charge acts as being electrically equivalent to chargeascribable to ionization of impurity, so that density of total fixedcharge generated in the carrier supply layer 23 is given by a sum ofionization charge density σ_(A) and polarization charge density σ_(G).

Based on the above relational expression (3), a condition under whichthe two-dimensional electron gas 14 is formed in the GaN channel layer12 in the vicinity of the interface thereof with the AlGaN carriersupply layer 23 may be expressed by the following relational expression(12):

[Mathematical Formula 25]

|σ_(A)|+|σ_(G)|<|σ_(P)|.  (12)

This condition can be re-written into the following condition, using theabove equations (2), (10) and (11):

[Mathematical Formula 26]

N _(A) ηt[cm⁻²]<5.6×10¹³ x _(a).  (12′)

Conforming to the relational expression, the two-dimensional electrongas 14 generates in the channel.

Based on the above relational expression (4), a condition under which aneffect of suppressing gate leakage current is obtained may be given asfollows:

|σ_(A)|+|σ_(G)|>|σ_(P)|/100.

The condition may be re-written as follows, using the above equations(2), (10) and (11):

N _(A) ×η×t[cm⁻²]+5.6×10¹³(x ₁ −x _(a))>5.6×10¹¹ x ₁.

As being combined with the above relational expression (12′), arelational expression under which the two-dimensional electron gas isformed in the channel, and the effect of suppressing gate current can beobtained, may be given as follows:

5.6×10¹¹ x ₁ <N _(A) ×η×t[cm⁻²]+5.6×10¹³(x ₁ −x _(a))<5.6×10¹³ x ₁.

Based on the above relational expression (8), a range of N_(A)×η whichthe effect of suppressing gate leakage current can be obtained, andI_(max) and V_(th) fall in more preferably ranges, may be expressed bythe relational expression (13) or (13′). These relational expressionsmay be re-written using the above equations (2), (10) and (11).

[Mathematical Formula 27]

|σ_(P)|/100<|σ_(A)|+|σ_(G)|<|σ_(P)|/2.  (13)

[Mathematical Formula 28]

5.6×10¹¹ x ₁ <N _(A) ×η×t[cm⁻²]+5.6×10¹³(x ₁ −x _(a))<2.8×10¹³ x₁.  (13′)

Based on the above relational expression (9), a more preferable range ofN_(A)×η may be expressed by the following relational expression (14) or(14′) which can be re-written using the above equations (2), (10) and(11):

[Mathematical Formula 29]

|σ_(P)|/10<|σ_(A)|+|σ_(G)|<|σ_(P)|/5.  (14)

[Mathematical Formula 30]

5.6×10¹² x ₁ <N _(A) ×η×t[cm⁻²]+5.6×10¹³(x ₁ −x _(a))<1.12×10¹³ x₁.  (14′)

If N_(A) and η in the carrier supply layer 23 composed of the AlGaNlayer are not uniform, the portion of N_(A)×η×t in the above-describedrelational expressions (13′) and (14′) are replaced by the followingformula:

[Mathematical  Formula  31]$\underset{0}{\int\limits^{t}}{{N_{A}(y)}{\eta (y)}{{y}.}}$

N_(A)(y) herein represents distribution of impurity concentration, η(y)represents distribution of activation ratio, wherein integral iscalculated in the direction normal to the substrate. Range ofintegration is determined from the interface of the carrier supply layer13 composed of AlGaN with the channel layer 12, to the interface thereofwith the gate electrode 17.

Next, embodiments according to the present invention will be explainedreferring to the attached drawings.

First Embodiment

FIG. 1 is a sectional view showing a configuration of an HJFET of thisembodiment. This HJFET may be manufactured as follows.

First, the following layers are sequentially grown on a (0001) SiCsubstrate 10 typically by the metal-organic chemical vapor deposition(abbreviated as MOCVD):

-   the buffer layer 11 composed of undoped AlN: 20 nm;-   the channel layer composed of undoped GaN 12: 2 μm; and-   the carrier supply layer 13 composed of p-type Al_(x)Ga_(1-x)N    (x=0.2): 20 nm.

AlGaN and GaN herein have different lattice constants, wherein athickness of 20 nm of the carrier supply layer 13 composed of p-typeAlGaN is not larger than the critical thickness where dislocation mayoccur. Magnesium (Mg), zinc (Zn) or the like may typically be usedherein as the p-type impurity.

Metals such as titanium (Ti)/aluminum (Al)/niobium (Nb)/gold (Au) or thelike are deposited by vacuum evaporation on the carrier supply layer 13,and alloyed to thereby form the source electrode 15S and the drainelectrode 15D respectively, while establishing ohmic contact. Next, thegate electrode 17 is formed on the carrier supply layer 13, or on thesurface of the AlGaN layer, in the portion fallen between the sourceelectrode 15S and the drain electrode 15D, by depositing metals such asnickel (Ni)/Au typically by vacuum evaporation, followed by lift-off. Inthis way, Schottky contact may be established at the interface 13A withthe carrier supply layer 13. Lastly, the surface passivation film 18composed of SiN is grown typically to as thick as 100 nm byplasma-enhanced chemical vapor deposition (abbreviated as PECVD). Inthis way, the semiconductor device as shown in FIG. 1 may bemanufactured.

Concentration N_(A) and activation ratio η of a p-type impurity in theAlGaN layer 13 which functions as the carrier supply layer 13 arecombined so as to satisfy the above relational expression (8′).

In thus-configured HJFET, an effect of suppressing gate leakage currentbased on the principle described above may be obtained, and I_(max) andV_(th) may fall in still more desirable ranges. For example, givenN_(A)=1×10¹⁸ cm⁻³ and n=0.5, the effective impurity concentration may be5×10¹⁷ cm⁻³. The gate leakage current herein is suppressed to as low asapproximately 12% of that in the prior art, that is, the case where thecarrier supply layer is composed of undoped Al_(0.2)Ga_(0.8)N. A rangeof reduction in I_(max) is approximately 9% as compared with the priorart, and V_(th) is given as approximately −2.3 V.

Second Embodiment

FIG. 6 is a drawing showing a sectional structure of a second embodimentof HJFET of the present invention. This embodiment is obtained byreplacing the carrier supply layer 13 composed of a p-type AlGaN layerin the first embodiment shown in FIG. 1, with the carrier supply layer23 composed of a p-type composition graded AlGaN layer:

-   the carrier supply layer 23 composed of p-type composition graded    Al_(x)Ga_(1-x)N (0.175≦x≦0.2): 20 nm.

AlGaN and GaN herein have different lattice constants, wherein athickness of 20 nm of p-type composition graded AlGaN is not larger thanthe critical thickness where dislocation may occur.

Magnesium (Mg), zinc (Zn) or the like may typically be used herein asthe p-type impurity. The Al compositional ratio of the p-typecomposition graded Al_(x)Ga_(1-x)N layer, or the carrier supply layer23, continuously decreases (x=0.2→0.175) from the interface (x₁=0.2)with the channel layer 12 to the surface (x₂=0.175).

This embodiment relates to the planar structure, wherein the Alcompositional ratio x_(a) of the carrier supply layer 23 at theinterface 23A thereof with the gate electrode 17 is equivalent tox₂=0.175.

When the carrier supply layer 23 is formed, amounts of supply oftrimethyl gallium (TMG), trimethyl aluminum (TMA) and ammonia (NH₃) gasthrough a gas introducing pipe of an MOCVD apparatus are adjusted,wherein the amounts supply of trimethyl aluminum (TMA) and ammonia (NH₃)are kept at constant levels, whereas the amount of supply of trimethylgallium (TMG) is gradually increased.

Concentration N_(A) and activation ratio η of p-type impurity in thecarrier supply layer 23 are combined so as to satisfy the aboverelational expression (13′). In thus-configured HJFET, an effect ofsuppressing gate current based on the principle described above may beobtained, and I_(max) and V_(th) may fall in still more desirableranges.

For example, given N_(A)=5×10¹⁷ cm⁻³ and η=0.6, the effective impurityconcentration is given as 3×10¹⁷ cm⁻³. In this case, the gate leakagecurrent is suppressed approximately to as low as 4% of that of aconfiguration in which the carrier supply layer has a uniformcomposition of undoped Al_(0.2)Ga_(0.8)N. The range of decrease inI_(max) in comparison with this configuration is given as approximately18%, and V_(th) as approximately −2.2 V.

The composition graded AlGaN is used for the p-type carrier supply layer23 in this embodiment, so that an effect of suppressing gate current maybe obtained at an impurity concentration lower than that in the firstembodiment using the compositionally uniform AlGaN. Because lowerimpurity concentration tends to improve the activation ratio,controllability of the epitaxial growth may be improved, and therebyyield ratio and reproducibility of the element characteristics mayfurther be improved.

The carrier supply layer 23 composed of a p-type AlGaN, configured inthis embodiment using the composition graded AlGaN layer in which the Alcompositional ratio continuously decreases, is not limited thereto,instead allowing adoption of a configuration in which the Al compositiondecreases in a step-wise manner, and allowing adoption of two or threeor more AlGaN layers varied in the composition in a step-wise manner.

Third Embodiment

FIG. 7 is a sectional view showing a configuration of an HJFET of thisembodiment.

In FIG. 7, a buffer layer 31 composed of undoped AlN, a channel layer 32composed of undoped GaN, and a carrier supply layer 33 composed ofp-type AlGaN are stacked in this order on a substrate 30 composed ofSiC. A two-dimensional electron gas 34 is formed in the channel layer 32in the vicinity of the interface thereof with the carrier supply layer33, based on piezoelectric polarization ascribable to difference in thelattice constant between AlGaN and GaN, and based on spontaneouspolarization.

Over the carrier supply layer 33 composed of AlGaN, a source electrode35S and a drain electrode 35D are formed, while individuallyestablishing ohmic contact therewith. A surface passivation film 36composed of SiN is formed over the AlGaN carrier supply layer 33. A gateelectrode 37 is formed in a recessed portion formed by etching off thesurface passivation film 36 and a part of the carrier supply layer 33,while establishing Schottky contact at the interface 33A with thecarrier supply layer 33. A part of the gate electrode 37 is buried inthe carrier supply layer 33.

The gate electrode 37 herein has an overhang portion 37F projected outtowards the drain electrode 35D side, thereby the gate electrode 37 isbrought into contact with the surface passivation film 36 in theoverhang portion thereof.

This sort of semiconductor device may be manufactured as follows. On the(0001) SiC substrate 30, the layer shown below are sequentially growntypically by the MOCVD:

-   the buffer layer 31 composed of undoped AlN: 20 nm;-   the channel layer 32 composed of undoped GaN: 2 μm; and-   the carrier supply layer 33 (x=0.2) composed of p-type    Al_(x)Ga_(1-x)N: 40 nm.

AlGaN and GaN herein have different lattice constants, wherein athickness of 40 nm of p-type Al_(x)Ga_(1-x)N layer which functions asthe carrier supply layer 33 is not larger than the critical thicknesswhere dislocation may occur. Mg, Zn or the like may typically be usedherein as the p-type impurity. Metals such as Ti/Al/Nb/Au or the likeare deposited by vacuum evaporation on the AlGaN layer, and alloyed tothereby form the source electrode 35S and the drain electrode 35Drespectively, while establishing ohmic contact.

Next, for example, the surface passivation film 36 composed of SiN isgrown approximately to as thick as 100 nm by PECVD. An opening is formedby etching the surface passivation film 36 in the portion thereof fallenbetween the source electrode 35S and the drain electrode 35D.

Next, a recessed portion is formed by etching off a part of the carriersupply layer 33, using the surface passivation film 36 as a mask,typically using a dry etching apparatus using a chlorine (Cl₂)-base gas.Over the recessed portion, metals such as Ni/Au are deposited by vaporevaporation, followed by lift-off process, to thereby form the gateelectrode 37 having the overhang portion 37F. In this way, Schottkycontact is established at the interface 33A with the AlGaN layer. Bythese procedures, the HJFET shown in FIG. 7 may be manufactured.

Also in this embodiment, concentration N_(A) and activation ratio η of ap-type impurity in the carrier supply layer 33 are combined so as tosatisfy the above relational expression (8′). In this embodiment, thegate electrode 37 is formed in contact with the recessed portion formedby removing a part of the carrier supply layer 33, so that the thicknesst of the p-type AlGaN layer in the above relational expression (8′)means the thickness of the p-type layer which resides in the portionfallen between the gate interface 33A and the channel layer 32, that is,the thickness of the p-type layer between the recessed portion and thechannel layer 32. The thickness in this embodiment is typically adjustedto t=20 nm.

In thus-configured HJFET, an effect of suppressing gate leakage currentbased on the principle described above may be obtained, and I_(max) andV_(th) may fall in still more desirable ranges. Assuming, for example,the Al compositional ratio x as 0.2, the p-type impurity concentrationN_(A) as 1×10¹⁸ cm⁻³ and the activation ratio η as 0.5 (the effectiveimpurity concentration is 5×10¹⁷ cm⁻³), the gate leakage current may besuppressed to as low as approximately 12% of that in the prior art(undoped AlGaN). A range of reduction in I_(max) is approximately 9% ascompared with the prior art, and V_(th) is given as approximately −2.3V.

In this embodiment, the gate electrode 37 is formed in the recessedportion formed by etching off a part of the carrier supply layer 33. Asa consequence, distance between the two-dimensional electron gas layer34 and the surface of AlGaN may be increased, while keeping thetransconductance at a high level by reducing the distance between thetwo-dimensional electron gas layer 34 and the gate electrode 37, andthereby instability ascribable to surface trap, such as currentcollapse, may be suppressed as compared with the first embodimentcharacterized by the planar structure.

In addition, the gate electrode 37 has the overhang portion 37F incontact with the surface passivation film 36 composed of SiN. Theoverhang portion 37F functions as a so-called field plate electrode.More specifically, a depletion layer is formed under the overhangportion 37F, electric field intensity between the gate and the drain isreduced, and thereby the gate breakdown voltage may be improved ascompared with the first embodiment having no overhang portion.

Fourth Embodiment

FIG. 8 is a sectional view showing a configuration of an HJFET of thisembodiment. This embodiment is obtained by replacing the carrier supplylayer 33 composed of p-type AlGaN in the third embodiment shown in FIG.7, with the carrier supply layer 43 composed of a p-type compositiongraded AlGaN layer shown below:

-   the carrier supply layer 43 composed of p-type composition graded    Al_(x)Ga_(1-x)N (0.15≦x≦0.2): 40 nm.

AlGaN and GaN herein have different lattice constants, wherein athickness of 40 nm of p-type composition graded AlGaN layer composingthe carrier supply layer 43 is not larger than the critical thicknesswhere dislocation may occur. Mg, Zn or the like may typically be usedherein as the p-type impurity.

The Al compositional ratio of the p-type composition gradedAl_(x)Ga_(1-x)N layer, which functions as the carrier supply layer 43,continuously decreases (x=0.2→0.15) from the interface (x₁=0.2) with thechannel layer 32 composed of GaN to the surface (x₂=0.15).

Because the recessed structure is adopted in this embodiment, the Alcompositional ratio x_(a) at the gate interface 43A will have a valuefallen between x₁ and x₂, which is x_(a)=0.175 for example.Concentration N_(A) and activation ratio η of p-type impurity of theAlGaN layer are combined so as to satisfy the above relationalexpression (13′). In this embodiment, the gate electrode 37 is formed incontact with the recessed portion formed by removing a part of thecarrier supply layer 43, so that the thickness t of the p-type AlGaNlayer in the above relational expression (13′) means the thickness ofthe p-type layer which resides in the portion fallen between the gateinterface 43A and the channel layer 32, that is, the thickness of thep-type layer between the recessed portion and the channel layer 32. Thethickness in this embodiment is typically adjusted to t=20 nm.

In thus-configured HJFET, an effect of suppressing gate leakage currentbased on the principle described above may be obtained, and I_(max) andV_(th) may fall in still more desirable ranges. Given, for example,N_(A)=5×10¹⁷ cm⁻³ and η=0.6 (effective impurity concentration is 3×10¹⁷cm⁻³), the gate leakage current may be suppressed to as low asapproximately 4% of that in the prior art (undoped uniform compositionof Al_(0.2)Ga_(0.8)N). A range of reduction in I_(max) is approximately18% as compared with the prior art, and V_(th) is given as approximately−2.2 V.

The composition graded AlGaN is used for the p-type carrier supply layerin this embodiment, so that an effect of suppressing gate current may beobtained at an impurity concentration lower than that in the thirdembodiment using the compositionally uniform AlGaN. Because lowerimpurity concentration tends to improve the activation ratio,controllability of the epitaxial growth may be improved, and therebyyield ratio and reproducibility of the element characteristics mayfurther be improved.

The p-type carrier supply layer 43, configured in this embodiment usingthe composition graded AlGaN layer, may of course be configured usingtwo or three or more AlGaN layers varied in the composition in astep-wise manner.

Fifth Embodiment

FIG. 9 is a sectional view showing a configuration of an HJFET of thisembodiment.

In FIG. 9, a buffer layer 51 composed of undoped AlN, a channel layer 52composed of undoped GaN, a p-type Al_(x)Ga_(1-x)N layer 531, and anundoped Al_(x)Ga_(1-x)N layer 532 are sequentially stacked on the SiCsubstrate 50.

A two-dimensional electron gas 54 is formed in the channel layer 52 inthe vicinity of the interface thereof with the p-type Al_(x)Ga_(1-x)Nlayer 531, based on piezoelectric polarization ascribable to differencein the lattice constant between GaN and AlGaN, and based on spontaneouspolarization.

Over the undoped AlGaN layer 532, a source electrode 55S and a drainelectrode 55D are formed, while individually establishing ohmic contacttherewith. A surface passivation film 56 composed of SiN is formed overthe undoped AlGaN layer 532.

A gate electrode 57 is formed in a recessed portion formed by etchingoff the surface passivation film 56 and a part of the undoped AlGaNlayer 532, while establishing Schottky contact at the interface 53A withthe AlGaN layer 532. The gate electrode 57 herein has an overhangportion 57F projected out towards the drain electrode 55D side, therebythe gate electrode 57 is brought into contact with the surfacepassivation film 56 in the overhang portion thereof.

Thus-configured HJFET may be manufactured as follows.

First, over the (0001) SIC substrate 50, the layers below are growntypically by MOCVD, in the order and to thickness described below:

-   the buffer layer 51 composed of undoped AlN: 20 nm;-   the channel layer 52 composed of undoped GaN: 2 μm;

the p-type Al_(x)Ga_(1-x)N layer 531 (x=0.2): 20 nm; and the undopedAl_(x)Ga_(1-x)N layer 532 (x=0.2): 20 nm.

AlGaN and GaN herein have different lattice constants, wherein a totalthickness of 40 nm of the p-type Al_(x)Ga_(1-x)N layer 531 and theundoped Al_(x)Ga_(1-x)N layer is not larger than the critical thicknesswhere dislocation may occur. Mg, Zn or the like may typically be usedherein as the p-type impurity.

Metals such as Ti/Al/Nb/Au or the like are deposited by vacuumevaporation on the undoped Al_(x)Ga_(1-x)N layer 532, and alloyed tothereby form the source electrode 55S and the drain electrode 55Drespectively, while establishing ohmic contact.

Next, for example, a SiN film which functions as the insulatingpassivation film 56 is grown approximately to as thick as 100 nm byPECVD. An opening is formed by etching the SiN film in the portionthereof fallen between the source electrode 55S and the drain electrode55D.

Next, a recessed portion is formed in the undoped AlGaN layer 532,typically by dry etching using a Cl₂-base gas, so as to remove a part ofundoped AlGaN layer 532 in a predetermined region thereof fallen betweenthe source electrode 55S and the drain electrode 55D, using the SiN filmas a mask.

Over the recessed portion, metals such as Ni/Au are deposited by vaporevaporation, followed by lift-off process, to thereby form the gateelectrode 57 having the overhang portion 57F. In this way, Schottkycontact is established at the interface 53A with the AlGaN layer. Bythese procedures, the HJFET shown in FIG. 9 may be manufactured.

In this embodiment, concentration N_(A) and activation ratio η of ap-type impurity in the p-type Al_(x)Ga_(1-x)N layer 531 are combined soas to satisfy the above relational expression (8′). The thickness t ofthe p-type AlGaN layer in the above relational expression (8′) means thethickness of the p-type layer which resides in the portion fallenbetween the gate interface 53A and the channel layer 52, and istypically adjusted to t=20 nm in this embodiment.

In thus-configured HJFET, an effect of suppressing gate leakage currentbased on the principle described above may be obtained, and I_(max) andV_(th) may fall in still more desirable ranges. Assuming, for example,the p-type impurity concentration N_(A) as 1×10¹⁸ cm⁻³ and theactivation ratio η as 0.5 (the effective impurity concentration is5×10¹⁷ cm⁻³), the gate leakage current may be suppressed to as low asapproximately 12% of that in the prior art (undoped Al_(0.2)Ga_(0.8)N).A range of reduction in I_(max) is approximately 9% as compared with theprior art.

In this embodiment, the gate electrode 57 is formed in the recessedportion formed by etching off a part of the undoped Al_(x)Ga_(1-x)Nlayer 532. For this reason, ionization charge density σ_(A) of thep-type impurity under the gate does not vary even if the depth of recessmay slightly vary. As a consequence, the process margin may be improvedas compared with the third embodiment forming the recessed portion inthe p-type Al_(x)Ga_(1-x)N layer 531, and thereby in-plane uniformity ofthe element characteristics may be improved.

Sixth Embodiment

FIG. 10 is a sectional view showing a configuration of an HJFET of thisembodiment. This embodiment is obtained by replacing the p-typeAl_(x)Ga_(1-x)N layer 531 and the undoped Al_(x)Ga_(1-x)N layer 532 inthe fifth embodiment shown in FIG. 9, respectively with the AlGaN layerstructures shown below:

-   a p-type composition graded Al_(x)Ga_(1-x)N layer 631 (0.175≦x≦0.2):    20 nm; and-   an undoped Al_(x)Ga_(1-x)N layer 632 (x=0.175): 20 nm.

AlGaN and GaN herein have different lattice constants, wherein a totalthickness of 40 nm of the p-type composition graded Al_(x)Ga_(1-x)Nlayer 631 and the undoped Al_(x)Ga_(1-x)N layer 632 is not larger thanthe critical thickness where dislocation may occur.

Mg, Zn or the like may typically be used herein as the p-type impurityin the p-type composition graded Al_(x)Ga_(1-n)N layer 631. The Alcompositional ratio of the p-type composition graded Al_(x)Ga_(1-x)Nlayer 631 continuously decreases (x=0.2→0.175) from the interface(x₁=0.2) with the channel layer 52 to the interface (x₂=0.175) with theundoped Al_(x)Ga_(1-x)N layer 632.

Because the recessed portion is formed by etching off a part of theundoped Al_(x)Ga_(1-x)N layer 632, the Al compositional ratio x_(a) atthe interface 63A with the gate electrode 57 is equivalent to x₂=0.175.

Concentration N_(A) and activation ratio η of p-type impurity in theAlGaN layer 631 are combined so as to satisfy the above relationalexpression (13′). The thickness t of the p-type AlGaN layer in the aboverelational expression (13′) means the thickness of the p-type layerwhich resides in the portion fallen between the gate interface 63A andthe channel layer 52, and is typically adjusted to t=20 nm in thisembodiment.

In thus-configured HJFET, an effect of suppressing gate leakage currentbased on the principle described above may be obtained, and I_(max) andV_(th) may fall in still more desirable ranges. Given, for example,N_(A)=5×10¹⁷ cm⁻³ and η=0.6 (the effective impurity concentration is3×10¹⁷ cm⁻³), the gate leakage current may be suppressed to as low asapproximately 4% of that in the prior art (undoped uniform compositionAl_(0.2)Ga_(0.8)N). A range of reduction in I_(max) is approximately 18%as compared with the prior art.

The composition graded AlGaN is used as the p-type carrier supply layerin this embodiment, so that an effect of suppressing gate current may beobtained at an impurity concentration lower than that in the fifthembodiment using the compositionally uniform AlGaN. Because lowerimpurity concentration tends to improve the activation ratio,controllability of the epitaxial growth may be improved, and therebyyield ratio and reproducibility of the element characteristics may beimproved.

The p-type carrier supply layer, configured in this embodiment using thep-type composition graded AlGaN layer 631, may of course be configuredusing two or three or more AlGaN layers varied in the composition in astep-wise manner.

Seventh Embodiment

FIG. 11 is a sectional view showing a configuration of an HJFET of thisembodiment.

In FIG. 11, an AlN buffer layer 71 composed of undoped, a channel layer72 composed of undoped GaN, a p-type Al_(x)Ga_(1-x)N layer 731, anundoped Al_(x)Ga_(1-x)N layer 732 and an n-type Al_(x)Ga_(1-x)N layer733 are stacked in this order on a substrate 70 composed of SiC. Atwo-dimensional electron gas 74 is formed in a GaN layer which functionsas the channel layer 72 in the vicinity of the interface thereof withthe p-type Al_(x)Ga_(1-x)N layer 731, based on piezoelectricpolarization ascribable to difference in the lattice constant betweenGaN and AlGaN, and based on spontaneous polarization.

On the n-type Al_(x)Ga_(1-x)N layer 733, a source electrode 75S and adrain electrode 75D are formed, while establishing ohmic contacttherewith. On the n-type Al_(x)Ga_(1-x)N layer 733, an insulatingsurface passivation film 76 composed of a SiN film is formed. A gateelectrode 77 is formed in the recessed portion formed by etching off theSiN film and the n-type Al_(x)Ga_(1-x)N layer 733, and a portion of theundoped Al_(x)Ga_(1-x)N layer 732, while establishing Schottky contactwith the Al_(x)Ga_(1-x)N layer 732 at an interface 73A. The gateelectrode 77 herein has an overhang portion 77F projected out towardsthe drain electrode 75D side, thereby the gate electrode 77 is broughtinto contact with the surface passivation film 76 in the overhangportion thereof.

Thus-configured HJFET may be manufactured as follows.

First, over the (0001) SiC substrate 70, the layers below aresequentially grown typically by MOCVD:

-   the buffer layer 71 composed of undoped AlN: 20 nm;-   the channel layer 72 composed of undoped GaN: 2 μm;-   the p-type Al_(x)Ga_(1-x)N layer 731 (x=0.2): 20 nm;-   the undoped Al_(x)Ga_(1-x)N layer 732 (x=0.2): 10 nm; and-   the n-type AlGaN layer 733 (x=0.2): 10 nm.

AlGaN and GaN herein have different lattice constants, wherein a totalthickness of 40 nm of the AlGaN layers (p-type AlGaN layer 731, undoped.Al_(x)Ga_(1-x)N layer 732 and n-type Al_(x)Ga_(1-x)N layer 733) is notlarger than the critical thickness where dislocation may occur.

Mg, Zn or the like may typically be used herein as the p-type impurityin the p-type Al_(x)Ga_(1-x)N layer 731, and silicon (Si) may typicallybe used as the n-type impurity in the Al_(x)Ga_(1-x)N layer 733.

Metals such as Ti/Al/Nb/Au or the like are deposited by vacuumevaporation on the n-type Al_(x)Ga_(1-x)N layer 733, and alloyed tothereby form the source electrode 75S and the drain electrode 75Drespectively, while establishing ohmic contact.

Next, for example, a SiN film which functions as the surface passivationfilm 76 is grown approximately to as thick as 100 nm by PECVD. Anopening is formed by etching the SiN film in the portion thereof fallenbetween the source electrode 75S and the drain electrode 75D. Next, arecessed portion is formed by etching off the n-type Al_(x)Ga_(1-x)Nlayer 733 and a part of the undoped Al_(x)Ga_(1-x)N layer 732, using theSiN film as a mask, typically using a dry etching apparatus using aCl₂-base gas. Over the recessed portion, metals such as Ni/Au aredeposited by vapor evaporation, followed by lift-off process, to therebyform the gate electrode 77 having the overhang portion 77F. In this way,Schottky contact of the gate electrode 77 with the undopedAl_(x)Ga_(1-x)N layer 732 is established at the interface 73A. By theseprocedures, the HJFET shown in FIG. 11 may be manufactured.

Concentration N_(A) and activation ratio η of p-type impurity in thep-type Al_(x)Ga_(1-x)N layer 731 are combined so as to satisfy the aboverelational expression (8′). The thickness t of the p-type AlCaN layer inthe above relational expression (8′) means the thickness of the p-typelayer which resides in the portion fallen between the gate interface 73Aand the channel layer 72, and is typically adjusted to t=20 nm in thisembodiment.

In thus-configured HJFET, an effect of suppressing gate leakage currentbased on the principle described above may be obtained, and I_(max) andV_(th) may fall in still more desirable ranges. Assuming, for example,the p-type impurity concentration N_(A) as 1×10¹⁸ cm⁻³ and theactivation ratio η as 0.5 (the effective impurity concentration is5×10¹⁷ cm⁻³), the gate leakage current may be suppressed to as low asapproximately 12% of that in the prior art (undoped Al_(0.2)Ga_(0.8)N).A range of reduction in I_(max) is approximately 9% as compared with theprior art.

In this embodiment, positive charge of ionized impurity generates in then-type AlGaN layer 733. As a consequence, the negative polarized chargein the Al_(x)Ga_(1-x)N layer 731 under the ohmic electrodes (the sourceelectrode 75S and the drain electrode 75D) may be canceled to reduce thedepletion layer, the potential barrier against electrons may be lowered,and thereby ohmic contact resistance may be reduced.

Eighth Embodiment

FIG. 12 is a sectional view showing a configuration of an HJFET of thisembodiment. This embodiment obtained by replacing the AlGaN layers(p-type Al_(x)Ga_(1-x)N layer 731, undoped Al_(x)Ga_(1-x)N layer 732 andn-type Al_(x)Ga_(1-x)N layer 733) in the seventh embodiment shown inFIG. 11, respectively with the AlGaN layer structures shown below:

-   a p-type composition graded Al_(x)Ga_(1-x)N layer 831 (0.175≦x≦0.2):    20 nm;-   an undoped Al_(x)Ga_(1-x)N layer 832 (x=0.175): 10 nm; and-   an n-type composition graded Al_(x)Ga_(1-x)N layer 833    (0.175≦x≦0.2): 10 nm.

AlGaN and GaN herein have different lattice constants, wherein a totalthickness of 40 nm of the AlGaN layers (p-type composition gradedAl_(x)Ga_(1-x)N layer 831, undoped Al_(x)Ga_(1-x)N layer 832, n-typecomposition graded Al_(x)Ga_(1-x)N layer 833) is not larger than thecritical thickness where dislocation may occur.

Mg, Zn or the like may typically be used herein as the p-type impurityin the p-type composition graded Al_(x)Ga_(1-x)N layer 831, and silicon(Si) may typically be used as the n-type impurity in the n-typecomposition graded Al_(x)Ga_(1-x)N layer 833.

The Al compositional ratio of the p-type composition gradedAl_(x)Ga_(1-x)N layer 831 continuously decreases (x=0.2→0.175) from theinterface (x₁=0.2) with the channel layer 72 to the interface (x₂=0.175)with the undoped Al_(x)Ga_(1-x)N layer 832. The Al compositional ratioof the n-type composition graded Al_(x)Ga_(1-x)N layer 833 continuouslydecreases (x=0.175→0.2) from the interface (x₂=0.175) with the undopedAl_(x)Ga_(1-x)N layer 832 to the surface (x₃=0.2).

Because the recessed portion is formed by etching off the n-typecomposition graded Al_(x)Ga_(1-x)N layer 833 and a part of the undopedAl_(x)Ga_(1-x)N layer 832, the Al compositional ratio x_(a) at theinterface 83A with the gate electrode 77 is equivalent to x₂=0.175.Concentration N_(A) and activation ratio η of a p-type impurity in thep-type composition graded Al_(x)Ga_(1-x)N layer 831 are combined so asto satisfy the above relational expression (13′). The thickness t of thep-type AlGaN layer in the above relational expression (13′) means thethickness of the p-type layer which resides in the portion fallenbetween the gate interface 83A and the channel layer 72, and istypically adjusted to t=20 nm in this embodiment.

In thus-configured HJFET, an effect of suppressing gate leakage currentbased on the principle described above may be obtained, and I_(max) andV_(th) may fall in still more desirable ranges. Given, for example,N_(A)=5×10¹⁷ cm⁻³ and η=0.6 (effective impurity concentration is 3×10¹⁷cm⁻³), the gate leakage current may be suppressed to as low asapproximately 4% of that in the prior art (undoped compositionallyuniform Al_(0.2)Ga_(0.8)N). A range of reduction in I_(max) isapproximately 18% as compared with the prior art.

The composition graded Al_(x)Ga_(1-x)N layer 831 is used as the p-typecarrier supply layer in this embodiment, so that an effect ofsuppressing gate leakage current may be obtained at an impurityconcentration lower than that in the seventh embodiment using thecompositionally uniform AlGaN. Because lower impurity concentrationtends to improve the activation ratio, controllability of the epitaxialgrowth may be improved, and thereby yield ratio and reproducibility ofthe element characteristics may be improved.

The p-type carrier supply layer, configured in this embodiment using thep-type composition graded Al_(x)Ga_(1-x)N layer 831, may of course beconfigured using two or three or more AlGaN layers varied in thecomposition in a step-wise manner.

Ninth Embodiment

FIG. 13 is a sectional view showing a configuration of an HJFET of thisembodiment.

In FIG. 13, a buffer layer 91 composed of undoped AlN, a channel layer92 composed of undoped GaN, a p-type Al_(x)Ga_(1-x)N layer 931 and anundoped Al_(x)Ga_(1-x)N layer 932 are stacked in this order on asubstrate 90 composed of SiC. A two-dimensional electron gas 94 isformed in the channel layer 92 in the vicinity of the interface thereofwith the p-type Al_(x)Ga_(1-x)N layer 931, based on piezoelectricpolarization ascribable to difference in the lattice constant betweenGaN and AlGaN, and based on spontaneous polarization.

Over the undoped Al_(x)Ga_(1-x)N layer 932, a source electrode 95S and adrain electrode 95D are formed, while individually establishing ohmiccontact therewith. A surface passivation film 96 composed of SiN isformed over the undoped Al_(x)Ga_(1-x)N layer 932. A gate electrode 97is formed in a recessed portion formed by etching off the surfacepassivation film 96 and a part of the undoped Al_(x)Ga_(1-x)N layer 932,while establishing Schottky contact at the interface 93A with theundoped Al_(x)Ga_(1-x)N layer 932.

The gate electrode 97 herein has an overhang portion 97F projected outtowards the drain electrode 95D side, thereby the gate electrode 97 isbrought into contact with the surface passivation film 96 in theoverhang portion thereof. In this embodiment, a Schottky electrode 99 isformed on the surface passivation film 96 in the portion thereof fallenbetween the gate electrode 97 and the drain electrode 95D.

Thus-configured HJFET may be manufactured as follows.

First, over the (0001) SiC substrate 90, the layers below are growntypically by MOCVD, in the order and to thickness described below:

-   the buffer layer 91 composed of undoped AlN: 20 nm;-   the channel layer 92 composed of undoped GaN: 2 μm;-   the p-type Al_(x)Ga_(1-x)N layer 931 (x=0.2): 20 nm; and-   the undoped Al_(x)Ga_(1-x)N layer 932 (x=0.2): 20 nm.

AlGaN and GaN herein have different lattice constants, wherein a totalthickness of 40 nm of the AlGaN layers (p-type Al_(x)Ga_(1-x)N layer 931and undoped N layer 932) is not larger than the critical thickness wheredislocation may occur.

Mg, Zn or the like may typically be used herein as the p-type impurityin the p-type Al_(x)Ga_(1-x)N layer 931. Metals such as Ti/Al/Nb/Au orthe like are deposited by vacuum evaporation on the undopedAl_(x)Ga_(1-x)N layer 932, and alloyed to thereby form the sourceelectrode 95S and the drain electrode 95D respectively, whileestablishing ohmic contact.

Next, for example, a SiN film which functions as the surface passivationfilm 96 is grown approximately to as thick as 100 nm by PECVD. Anopening is formed by etching the SiN film in the portion thereof fallenbetween the source electrode 95S and the drain electrode 95D. Next, arecessed portion is formed by etching off a part of the undopedAl_(x)Ga_(1-x)N layer 932, using the SiN film as a mask, typically usinga dry etching apparatus using a Cl₂-base gas.

Over the recessed portion, metals such as Ni/Au are deposited by vaporevaporation, followed by lift-off process, to thereby form the gateelectrode 97 having the overhang portion 97F. In this way, Schottkycontact with the AlGaN layer is established at the interface 93A. TheSchottky electrode 99 is formed on the surface passivation film 96 inthe portion thereof fallen between the gate electrode 97 and the drainelectrode 95D, typically by depositing metals such as Ti/platinum(Pt)/Au by vapor evaporation, followed by the lift-off process. By theseprocedures, the HJFET shown in FIG. 13 may be manufactured.

Concentration N_(A) and activation ratio η of p-type impurity in theAl_(x)Ga_(1-x)N layer 931 are combined so as to satisfy the aboverelational expression (8′). The thickness t of the p-type AlGaN layer inthe above relational expression (8′) means the thickness of the p-typelayer which resides in the portion fallen between the gate interface 93Aand the channel layer 92, and is typically adjusted to t=20 nm in thisembodiment.

In thus-configured HJFET, an effect of suppressing gate leakage currentbased on the principle described above may be obtained, and I_(max) andV_(th) may fall in still more desirable ranges. Assuming, for example,the p-type impurity concentration N_(A) as 3×10¹⁸ cm⁻³ and theactivation ratio η as 0.33 (the effective impurity concentration is1×10¹⁸ cm⁻³), the gate leakage current may be suppressed to as low asapproximately 1% of that in the prior art (undoped Al_(0.2)Ga_(0.8)N). Arange of reduction in I_(max) is approximately 18% as compared with theprior art.

In this embodiment, the Schottky electrode 99 functions also asso-called Faraday shield, as being connected to the source. Morespecifically, electrical coupling between the gate and the drain may beshielded, capacitance between the gate and the drain may be reduced, andthereby the gain and isolation characteristics may be improved. TheSchottky electrode 99 may be connected to the gate. In this case, theSchottky electrode 99 may function as so-called field plate, andbreakdown voltage of the gate may further be improved.

Tenth Embodiment

FIG. 14 is a sectional view showing a configuration of an HJFET of thisembodiment.

In FIG. 14, a buffer layer 101 composed of undoped AlN, a channel layer102 composed of undoped GaN, a p-type Al_(x)Ga_(1-x)N layer 1031 and anundoped Al_(x)Ga_(1-x)N layer 1032 are sequentially stacked on asubstrate 100 composed of SiC. A two-dimensional electron gas 104 isformed in the channel layer 102 in the vicinity of the interface thereofwith the p-type Al_(x)Ga_(1-x)N layer 1031, based on piezoelectricpolarization ascribable to difference in the lattice constant betweenGaN and AlGaN, and based on spontaneous polarization.

Over the undoped Al_(x)Ga_(1-x)N layer 1032, a source electrode 105S anda drain electrode 105D are formed, while individually establishing ohmiccontact therewith. A SiN film which functions as a first surfacepassivation film 106 is formed over the undoped Al_(x)Ga_(1-x)N layer1032. A gate electrode 107 is formed in a recessed portion formed byetching off the first surface passivation film 106 and a part of theundoped Al_(x)Ga_(1-x)N layer 1032, while establishing Schottky contactat the interface 103A with the undoped Al_(x)Ga_(1-x)N layer 1032.

The gate electrode 107 herein has an overhang portion 107F projected outtowards the drain electrode 105D side, thereby the gate electrode 107 isbrought into contact with the first surface passivation film 106 in theoverhang portion thereof. In this embodiment, a second surfacepassivation film 108 is further provided in the region fallen betweenthe source electrode 105S and the drain electrode 105D, so as to coverthe top surfaces of the first surface passivation film 106 and the gateelectrode 107. The second surface passivation film is composed of a SiNfilm, and a Schottky electrode 109 is formed on the second surfacepassivation film 108 in the portion thereof fallen between the gateelectrode 107 and the drain electrode 105D.

Thus-configured HJFET may be manufactured as follows.

First, over the substrate 100 composed of (0001) SiC, the layers beloware sequentially grown typically by MOCVD:

-   the buffer layer 101 composed of undoped AlN: 20 nm;-   the channel layer 102 composed of undoped GaN: 2 μm;-   the p-type Al_(x)Ga_(1-x)N layer 1031 (x=0.2): 20 nm; and-   the undoped Al_(x)Ga_(1-x)N layer 1032 (x=0.2): 20 nm.

AlGaN and GaN herein have different lattice constants, wherein a totalthickness of 40 nm of the AlGaN layers (p-type Al_(x)Ga_(1-x)N layer1031 and undoped Al_(x)Ga_(1-x)N layer 1032) is not larger than thecritical thickness where dislocation may occur.

Mg, Zn or the like may typically be used herein as the p-type impurityin the p-type Al_(x)Ga_(1-x)N layer 1031. Metals such as Ti/Al/Nb/Au orthe like are deposited by vacuum evaporation on the undopedAl_(x)Ga_(1-x)N layer 1032, and alloyed to thereby form the sourceelectrode 105S and the drain electrode 105D respectively, whileestablishing ohmic contact.

Next, for example, a SiN film which functions as the first surfacepassivation film 106 is grown approximately to as thick as 100 nm byPECVD. An opening is formed by etching the SiN film in the portionthereof fallen between the source electrode 105S and the drain electrode105D. Next, a recessed portion is formed by etching off a part of theundoped Al_(x)Ga_(1-x)N layer 1032, using the first surface passivationfilm 106 as a mask, typically using a dry etching apparatus using aCl₂-base gas. Over the recessed portion, metals such as Ni/Au aredeposited by vapor evaporation, followed by lift-off process, to therebyform the gate electrode 107 having the overhang portion 107F. In thisway, Schottky contact with the undoped Al_(x)Ga_(1-x)N layer 1032 isestablished at the interface 103A.

Next, for example, the SiN film 108 which functions as the secondsurface passivation film is grown by PECVD typically to as thick as 200nm or around. Metals such as Ti/Pt/Au are deposited by vapor evaporationon the second surface passivation film 108 in the portion thereof fallenbetween the gate electrode 107 and the drain electrode 105D, followed bylift-off process, to thereby form the Schottky electrode 109. By theseprocedures, the HJFET shown in FIG. 14 may be manufactured.

Concentration N_(A) and activation ratio η of p-type impurity in theAlGaN layer 1031 are combined so as to satisfy the above relationalexpression (8′). The thickness t of the p-type AlGaN layer in the aboverelational expression (8′) means the thickness of the p-type layer whichresides in the portion fallen between the gate interface 103A and thechannel layer 102, and is typically adjusted to t=20 nm in thisembodiment.

In thus-configured HJFET, an effect of suppressing gate leakage currentbased on the principle described above may be obtained, and I_(max) andV_(th) may fall in still more desirable ranges. Assuming, for example,the p-type impurity concentration N_(A) as 3×10¹⁸ cm⁻³ and theactivation ratio η as 0.33 (the effective impurity concentration is1×10¹⁸ cm⁻³), the gate leakage current may be suppressed to as low asapproximately 1% of that in the prior art (undoped Al_(0.2)Ga_(0.8)N). Arange of reduction in I_(max) is approximately 18% as compared with theprior art.

The configuration of this embodiment is such as having the secondsurface passivation film 108 is formed between the gate electrode 107and the Schottky electrode 109. Then, the Schottky electrode 109 cansurround at least a part of the gate electrode 107, while the secondsurface passivation film 108 is disposed between the Schottky electrode109 and the gate electrode 107. Accordingly, if the Schottky electrode109 is connected to the source, the effect of shielding between the gateand the drain may considerably be improved, and thereby the gain andisolation characteristics can further be improved.

The present invention, having been described above referring to theembodiments, is not limited to the above-described embodiments, and ofcourse allows various embodiments conforming to the principle of thepresent invention.

For example, AlGaN used as a material for composing the carrier supplylayer in the above-described embodiments may be replaced by other GroupIII nitride semiconductors. For example, InAlN, InGaN, InAlGaN, AlN orGaN may be used. Alternatively, super lattice layers composed of atleast two different semiconductors selected from GaN, AlGaN, InAlN,InGaN, InAlGaN, AlN and InN may be adoptable.

Although, in the above-described embodiments, the carrier supply layercomposed of p-type AlGaN was formed as being brought into contact withthe GaN channel layer, an undoped AlGaN spacer layer may be interposedbetween the GaN layer and the p-type AlGaN layer. Alternatively, ann-type impurity, such as Si, may be doped into a part of the AlGaNcarrier supply layer.

The channel material, for which GaN was used in the above-describedembodiments, may be any other Group III nitride semiconductor having aband gap smaller than that of the carrier supply layer. For example,InN, InGaN, AlGaN, InAlN or InAlGaN may be adoptable. The channel layer,having been described as being an undoped one, may contain an n-typeimpurity such as Si doped into a part, or entire portion thereof.

Although, in the above-described embodiments, SiN was used as a materialcomposing the insulating passivation film, a material for composing theinsulating passivation film may be any other dielectric. For example,SiO₂ or SiON may be used.

Although, in the above-described embodiments, SiC was used as asubstrate material, any other substrate may be adoptable. For example,sapphire, Si or GaN may be adoptable.

1. A field effect transistor comprising: a channel layer composed ofIn_(y)Ga_(1-y)N (0≦y≦1); a carrier supply layer composed ofAl_(x)Ga_(1-x)N (0≦x≦1), said carrier supply layer being provided oversaid channel layer and including at least one p-type layer; and a sourceelectrode, a drain electrode and a gate electrode which are disposedfacing said channel layer through said p-type layer, and provided oversaid carrier supply layer, wherein the following relational expressionis satisfied:5.6×10¹¹ x<N _(A) ×η×t[cm⁻²]<5.6×10¹³ x,  [Mathematical Formula 1] wherex denotes an Al compositional ratio of said carrier supply layer, tdenotes a thickness of said p-type layer, N_(A) denotes an impurityconcentration, and η denotes an activation ratio.
 2. The field effecttransistor as claimed in claim 1, satisfying the following relationalexpression:5.6×10¹¹ x<N _(A) ×η×t[cm⁻²]<2.8×10¹³ x.  [Mathematical Formula 2]
 3. Afield effect transistor comprising: a channel layer composed ofIn_(y)Ga_(1-y)N (0≦y≦1) in which two-dimensional electron gas is to beformed; a carrier supply layer composed of Al_(x)Ga_(1-x)N (0≦x≦1), saidcarrier supply layer being provided over said channel layer andincluding at least one p-type layer; and a source electrode, a drainelectrode and a gate electrode which are disposed facing said channellayer through said p-type layer, and provided over said carrier supplylayer, wherein: the following expression is satisfied:x_(a)<x₁, where x_(a) denotes an Al compositional ratio of said carriersupply layer at an interface with the gate electrode, and x₁ denotes anAl compositional ratio at an interface with said channel layer; and thefollowing expression is satisfied:5.6×10¹¹ x ₁ <N _(A) ×η×t[cm⁻²]+5.6×10¹³(x ₁ −x _(a))<5.6×10¹³ x₁,  [Mathematical Formula 3] where x_(a) denotes the Al compositionalratio, t denotes a thickness of said p-type layer, N_(A) denotes animpurity concentration, and η denotes an activation ratio.
 4. The fieldeffect transistor as claimed in claim 3, satisfying the followingrelational expression:5.6×10¹¹ x ₁ <N _(A) ×η×t[cm⁻²]+5.6×10¹³(x ₁ −x _(a))<2.8×10¹³ x₁.  [Mathematical Formula 4]
 5. The field effect transistor as claimedin claim 1, wherein said gate electrode is provided on a same planetogether with said source electrode and said drain electrode.
 6. A fieldeffect transistor comprising: a channel layer composed ofIn_(y)Ga_(1-y)N (0≦y≦1); a carrier supply layer composed ofAl_(x)Ga_(1-x)N (0≦x≦1), said carrier supply layer being provided oversaid channel layer and including at least one p-type layer; and a sourceelectrode, a drain electrode and a gate electrode which are disposedfacing said channel layer through said p-type layer, and provided oversaid carrier supply layer, said gate electrode being formed to be incontact with a recess portion formed by removing a part of said carriersupply layer, wherein the following relational expression is satisfied:5.6×10¹¹ x<N _(A) ×η×t[cm⁻²]<5.6×10¹³ x, where t denotes a thickness ofsaid p-type layer between said recessed portion and said channel layer,N_(A) denotes an impurity concentration, and η denotes an activationratio.
 7. A field effect transistor comprising: a channel layer composedof In_(y)Ga_(1-y)N (0≦y≦1); a carrier supply layer composed ofAl_(x)Ga_(1-x)N (0≦x≦1), said carrier supply layer being provided oversaid channel layer and including at least one p-type layer; and a sourceelectrode, a drain electrode and a gate electrode which are disposedfacing said channel layer through said p-type layer, and provided oversaid carrier supply layer, said gate electrode being formed to be incontact with a recess portion formed by removing a part of said carriersupply layer, wherein the following relational expression is satisfied:5.6×10¹¹ x ₁ <N _(A) ×η×t[cm⁻²]+5.6×10¹³(x ₁ −x _(a))<5.6×10¹³ x ₁,where x_(a) denotes an Al compositional ratio of said carrier supplylayer at an interface with said gate electrode and is smaller than x₁,x₁ denotes an Al compositional ratio at an interface with said channellayer, t denotes a thickness of said p-type layer between said recessedportion and said channel layer, N_(A) denotes an impurity concentration,and η denotes an activation ratio.
 8. The field effect transistor asclaimed in claim 1, wherein said field effect transistor has a negativethreshold voltage.
 9. The field effect transistor as claimed in claim 2,wherein said gate electrode is provided on a same plane together withsaid source electrode and said drain electrode.
 10. The field effecttransistor as claimed in claim 3, wherein said gate electrode isprovided on a same plane together with said source electrode and saiddrain electrode.
 11. The field effect transistor as claimed in claim 4,wherein said gate electrode is provided on a same plane together withsaid source electrode and said drain electrode.
 12. The field effecttransistor as claimed in claim 2, wherein said field effect transistorhas a negative threshold voltage.
 13. The field effect transistor asclaimed in claim 3, wherein said field effect transistor has a negativethreshold voltage.
 14. The field effect transistor as claimed in claim4, wherein said field effect transistor has a negative thresholdvoltage.
 15. The field effect transistor as claimed in claim 5, whereinsaid field effect transistor has a negative threshold voltage.
 16. Thefield effect transistor as claimed in claim 6, wherein said field effecttransistor has a negative threshold voltage.
 17. The field effecttransistor as claimed in claim 7, wherein said field effect transistorhas a negative threshold voltage.